Technics Products
Through our Technics product division we offer photoresist stripping, reactive ion etching and plasma PCVD tools that are ideal for university and research lab use.
2100 ICP Series (ICP)
Inductive Coupled Plasma etching tool available in either a batch or loadlock configuration. The high density plasma source gives the fastest etch rates while maintaining precise control of etch profiles and ionic bombardment.
5000 Series IAE/IAD
Ion Assisted Etching/Deposition tool capable of fine line, high aspect ratio etching of dielectric, semiconductor and metal films. The 5000 Series offers processing capabilies beyond conventional plasma etching and PECVD, such as one-step Copper etch and one-step Poly Silicon deposition, available for very large substrates, either a batch processing or loadlock configuration.
5000 Series IAE Copper Etch the one and only to replace CMP with a one-step process, that is clean, fast and uniform. We will send you a micrograph, if you are responsible for Cu processes, we won't wait long.
