History
Technics Plasma is a privately held process equipment manufacturer that supplies capital equipment to the worldwide micro-electronic markets and has for over 25-years. The company holds patented technology and other intellectual property used in micro-electronic manufacturing for Semiconductor Devices, III-V Materials and Flat Panel Displays or large area substrates. Our customers include universities, government research labs and commercial device manufacturers worldwide.
The company’s core technology is used in the manufacturing of plasma and ion beam related equipment used in: Reactive Ion Etching, ICP Etching and Plasma CVD, Ion Assisted Etching and Ion Assisted CVD.
Technics Plasma has experienced accelerated rates of growth with the majority of business coming from Asia and the United States. Technics Plasma is now looking to continue its rapid growth by expanding our network of sales/service offices worldwide.
In 2002 Technics Plasma aquired the plasma equipment line of Advanced Technologies Corp.including all key intellectual property, trademarks and support documentation. Technics was well known for providing inexpensive, quality plasma based products that are ideal for university and research lab use. Technics has combined the Advanced Technologies product line with its own, now offering large high-through-put production process systems for Ion Assisted Etching of Copper and Ion Assisted Deposition of Poly Silicon on substrates up to 3-meters x 3-meters.
Today the micro-electronic process equipment line is manufactured at our production facility in California. Because of increasing demand, Advanced Technologies is now looking to acquire additional space to increase our manufacturing capacity. Also planned is a new Applications Lab/Customer Training Center to help better serve our existing and future customers.
